High-purity Molybdenum Planar Target and Rotary Target

For flat panel displays, sputtering targets are mainly used in the production of display panels and touch screen panels. The main types of targets used include molybdenum targets, aluminum targets, aluminum alloy targets, chromium targets, copper targets, copper alloy targets, silicon targets, titanium targets, niobium targets and indium-tin oxide (ITO) targets.

Product Description

产品用途：高纯钼平面靶材和旋转靶材主要应用于TFT-LCD制造中的栅极和源/漏电极。

Application:

High- purity molybdenum planar and rotary targets are mainly used in electrode gates and source / drain electrodes in TFT-LCD manufacturing.

产品性能参数/Product Property Parameters：

化学成分 Chemical Compositions
主含量，（%，不小于） Main Content, %, min	Mo	99.95	99.97
杂质含量（质量分数），（%，不大于） Impurity Content (mass fraction), %, max	Al	0.0050	0.0010
	Ca	0.0020	0.0020
	Cr	0.0100	0.0020
	Cu	0.0020	0.0020
	Fe	0.0050	0.0020
	K	-	0.0020
	Mg	0.0020	0.0010
	Na	-	0.0010
	Ni	0.0050	0.0010
	Si	0.0050	0.0020
	W	0.0300	0.0300
	S	0.0050	-
	Cd	0.0001	-
	C	0.0100	0.0030
	O	0.0080	0.0040
	N	0.0030	0.0010
注：钼含量为100%减去表中所列杂质元素实测含量的总和（不包含气体元素）；需方如有特殊要求时，由供需双方协商确定，并在合同（或订货单）中注明。 Note: Molybdenum content is the sum of 100% minus the measured content of impurity elements listed in the table (excluding gas elements). Special requirements will be agreed upon by the supplier and buyer, and indicated in the contract or purchase order.

其他性能Other Properties:

牌号

Grade

密度

Density

(g/cm3)

平均晶粒尺寸Average Grain Size (um)

粗糙度Roughness (um)

平面度

Flatness

(mm)

贴合率Bonding Rate

≥10.15

≤100

≤0.8

≤0.30

≥98%

尺寸Size:

形状Shape	产品世代	靶材尺寸（mm）
平面Planar	G2.5	7106308
	G 4.5	1200113012
	G5	1700143112
	G5.5	1950158016
	G6	2300180014
	G6	230019016
	G8.5	265021018
	G10.5	343020020
旋转Rotary	G6	φ135/167*2158
旋转Rotary	G8.5	φ135/167*2692