Semiconductor Materials

Ion Implantation Parts

product description


产品用途:

用来生产半导体离子注入零件。

Application:

They are used to produce parts of the semiconductor ion implanter.

 

产品性能参数/Product Property Parameters

产品名称Name

W

Mo

TZM

密度Density

(g/cm3)

19.1

10.15

10.05

 

产品加工精度参数/Product Processing Accuracy Parameters

主要材质

Main Materials

 

加工范围

Processing

Range

 

尺寸精度Dimensional Accuracy (mm)

 

形状精度Shape Accuracy (mm)

 

位置精度Position Accuracy (mm)

 

光洁度Finish

(Ra, μm)

WMTZM

0.00-5.00

±0.003

0.01

0.005

0.2-0.4

WMTZM

5.01-15.00

±0.005

0.015

0.006

0.4

WMTZM

15.01-30

±0.008

0.02

0.007

0.4

WMTZM

30.01-100

±0.010

0.025

0.008

0.6

WMTZM

> 100

±0.0127

0.030

0.010

0.6


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